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Name: Prall K CMOS Plasma and Process Damage 2025
Format: pdf
Size: 74.25 MB

Title: CMOS Plasma and Process Damage
Author: Kirk Prall
Language: polski
Year: 2025
Subjects: Science & Technology, Engineering, Electrical & Electronic Engineering, Electronics - Circuits - General, Electronic circuits
Publisher: Springer-Verlag New York, LLC
ISBN: 9783031890291
Total pages: 473

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.